Department of Electrical Engineering

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IIT Jodhpur

An algorithm for ideal sliding mode control of low inertia motor is discussed. The algorithm has been successfully tested through simulation as well as practical implementation.

World University root node

Proceedings of the American Control Conference

One switching sliding mode position control of printed circuit DC motor

This paper presents a mew algorithm for variable structure control systems. In the proposed algorithm a VEViable strnctnre controller for low moment of inertia systems has been discnssed. The concept nses the position and velocity loop independently at different instants of time. Switching from position loop to velocity loop generates sliding mode motion. The proposed method requires only one switching. Chattering is totally absent. The algorithm has been tested successfully in printed circuit DC motor throngh computer simulation aa well as practical implementation. The practical controller is a hybrid one where adog, digital and au IBM PC has been used to verify the concept. © 1992 by IEEE Singapore Section.

Singapore International Conference on Intelligent Control and Instrumentation - Proceedings

A smooth variable structure position control of PCB motor

Variable structure control using sliding mode technique has been widely used for different electrical motors in position loop. Its advantages are insensitivity to parametric variations and ability to reject disturbances like sudden load applied to the motor shaft. However, for a low inertia systems it exibibits more chattering. In this paper, a sliding mode controller for a very low inertia system (Printed circuit motor) is proposed. A new chattering reduction technique is also proposed here. Controller structure is a hybrid one where analog circuit has been reduced to a minimum level. Computer simulation as well as experimented results are presented to verify the chattering reduction technique. © 1991 IEEE.

IEEE Region 10 Annual International Conference, Proceedings/TENCON

A smooth variable structure position control of dc motor

For long wavelength single node DFB type laser devices it is required to corrugate the surface of InP substrate in the form of lines (Grating) with spatial period in sub-half micron range. Electron beam lithography (EBL) can be used to make such high resolution lines first in the resist and then these lines can be transferred to the substrate by suitable dry or wet etching process. In delineating such closely spaced lines in the resist which is coated on a relatively high average atomic number substrate (At.No.32), the well known proximity exposure (PE) effect associated with EBL requires correction. The paper discusses and gives the simulation results which depict the effect of PE on the width and spacing of lines. A comparison is made between the lines on the lower At.No. substrate Si, and high At.No. InP substrate. A proximity exposure compensation (PEC) scheme based on dose variation technique is found to provide just adequate correction to PE effect. The experimental results on the delineation of lines before and after correction show good agreement with the simulated results within experimental limitations. © 1991 SPIE. All rights reserved.

Proceedings of SPIE - The International Society for Optical Engineering

Application of electron beam lithography to produce corrugated surface for DFB lasers

Robust state feedback stabilization of a structured uncert ain system problem is discussed here. Existence of such a Robust state feedback and its uniqueness in the sense of some error norm minimization are presented in this paper. A new proof is given to show the existence of Robust state feedback gain for a given structured uncertain system. Algorithm for the selection of best state feedback gain from all stabilizing state feedback gain is also proposed in this paper. © 1991 IEEE.

Robust state feedback control for structured uncertain system

Fast recognition and location of registration marks on the wafer is essential requirement for alignment in e-beam direct writing applications. However, high speed alignment techniques often lead to deterioration of accuracy of alignment. The present paper describes a method for extracting the features of a registration mark from its SEM image, for storing it as a template and for detection of similar registration marks on the wafer. A knowledge base of the registration mark features is formed which is used for subsequent semi-heuristic comparison. © 1990.

Microelectronic Engineering

A SEM-image processing method for recognition and fast location of IC registration marks

The electron beam exposure over extended periods of time using guassion electron beam in a SEM like column is highly prone to variation in exposure dose due to changes in the incident beam current, charging on the resist surface etc. This leads to the loss of global linewidth control. This paper presents a method in which the exposure current is monitored in-situ and the required correction to the exposure time is provided automatically in order to maintain uniform exposure globally. © 1990.

Online exposure dose correction during electron beam pattern delineation by blanking pulse width modulation.

An algorithm for a model-order reduction method based on impulse/step response error minimization is presented. The denominator of the reduced model is selected by either the Routh method or the retention of the desired poles of the higher order system. The numerator of the reduced model is obtained by minimizing the impulse/step response error along with a steady-state constraint. It is shown that this minimization problem finally leads to a problem of solving linear algebraic equations to obtain the numerator of the model.

Proceedings - IEEE International Symposium on Circuits and Systems

A new algorithm for model reduction by impulse/step error minimisation

This paper presents an application of SEM-Voltage Contrast for the estimation of parasitic capacitances and leakage impedances in a failed circuit. The measurements were performed on a thick film hybrid resistor, as a case study, which fractured due to excessive current flow and where the nodes are accessible only through electron beam. An analytical expression relating the parasitic parameters to be measured is derived. The experimental and simulated results match within 10% of the experimental observations. © 1990.

Sem-voltage contrast as a tool for measurement of circuit parasitics

A unification of the time- and frequency-domain Pade approximation -method for multivariable systems is presented here. It has been shown in this letter that both time- and frequency-domain approximation methods for multivariable systems lead to partial Pade approximation. Full Pade exists only in the case of scalar systems. © 1989 IEEE