The electron beam exposure over extended periods of time using guassion electron beam in a SEM like column is highly prone to variation in exposure dose due to changes in the incident beam current, charging on the resist surface etc. This leads to the loss of global linewidth control. This paper presents a method in which the exposure current is monitored in-situ and the required correction to the exposure time is provided automatically in order to maintain uniform exposure globally. © 1990.

Kamaljit Rangra

Department of Electrical Engineering

IIT Jodhpur

N.K.L. Raja

M. Singh

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Journal	Microelectronic Engineering
ISSN	01679317