A unified compact model for gate-all-around (GAA) FETs is discussed. This single unified model can accurately model different shapes of GAA FETs. In this work, we present its validation with the reported GAA FETs: stacked GAA nanosheet, stacked nanowire MOS-FETs, Multi-bridge-channel MOSFETs and Twin silicon nanowire MOSFETs. This study shows that the BSIM-CMG unified multi-gate MOSFET model is ready for production design of silicon GAA based circuits and technology-product co-development for future technology nodes. © 2018 by TechConnect. All rights reserved.