The present work explores the temperature dependent transport behavior of n-InN nanodot/p-Si (100) heterojunction diodes. InN nanodot (ND) structures were grown on a 20 nm InN buffer layer on p -Si(100) substrates. These dots were found to be single crystalline and grown along  direction. The junction between these two materials exhibits a strong rectifying behavior at low temperatures. The average barrier height (BH) was determined to be 0.7 eV from current-voltage-temperature, capacitance-voltage, and flat band considerations. The band offsets derived from built-in potential were found to be Δ E C =1.8 eV and Δ EV =1.3 eV and are in close agreement with Anderson's model. © 2010 American Institute of Physics.