To address the formidable challenges associated with large-scale and high-quality fabrication of MoS2, we reported a two-step process for growing large-scalable MoS2 films with superb quality. Firstly, we grow different thickness Mo films on SiO2/Si substrates by DC magnetron sputtering technique. Secondly, the deposited film was then sulfurized in a sulfur-rich environment. The qualitative analysis confirmed the growth of highly crystalline and continuous few-layer to multi-layer MoS2 films. We have also examined the sensing performance of deposited ML-MoS2 film upon NO2 exposure. © 2019 IEEE.