A detailed study of pulsed laser deposited ZnO and Si thin films for its applications as a medium of UV laser is presented. As such, the films are deposited using pulsed laser deposition technique using pulsed laser deposition technique using third harmonic of (355 nm) and fundamental wavelength of a Q-switched Nd:YAG laser. A steep rise in the output after the input pump energy exceeds a critical value is observed which can be taken as the lasing threshold.

Narayanan V

Department of Physics

IIT Jodhpur

R.K. Thareja

A. Mitra

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Journal	IEEE International Conference on Plasma Science
ISSN	07309244