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Oxidation of Planar and Plasmonic Ag Surfaces by Exposure to O2/Ar Plasma for Organic Optoelectronic Applications
C.E. Petoukhoff, C. Antonick, , K.M. Dani, D.M. O'Carroll
Published in Materials Research Society
2016
Volume: 1
   
Issue: 14
Pages: 943 - 948
Abstract
Here, we expose planar and plasmonic Ag surfaces to a low-power O2/Ar plasma to form an ultrathin surface oxide layer. We study the chemical state and morphology of the plasma-treated Ag surfaces using X-ray photoelectron spectroscopy, scanning electron microscopy, and dark-field microscopy. We observe the formation of an ultrathin layer (< 10 nm) composed of both AgO x and Ag2CO3 for a plasma exposure time of 1 s by investigating shifts in the Ag3d, O1s, and C1s core level binding energies. For an exposure time of 1 s, the surface structure of the planar and plasmonic Ag surfaces remains unchanged. For exposure times of 5 - 30 s, the planar Ag surfaces become porous and exhibit increased surface roughness. We demonstrate that the plasma-treated planar and plasmonic Ag surfaces lead to improvements in the excited-state population of a polymer:fullerene coating through ultrafast pump-probe reflectometry. Copyright © Materials Research Society 2016.
About the journal
JournalMRS Advances
PublisherMaterials Research Society
ISSN20598521