In this work, process development for the realization of Microchannels is carried out using standard micro fabrication techniques with polysilicon as sacrificial material. Polysilicon (PolySi) material is deposited using LPCVD process. Thermal silicon oxide layer work as a capping layer after the polysilicon layer is released using wet chemical etching using Tetra Methyl Ammonium Hydroxide (TMAH). Fabricated microchannels are characterized using 3D optical imaging and scanning electron microscopy. Fabrication of the Microchannel with an open cross-section of 4 μm X 0.85 μm and 50 μm length is demonstrated. © 2019 IEEE.