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Impact of back plane doping on RF performance of FD-SOI transistor
C.K. Dabhi, P. Kushwaha, A. Dasgupta, , Y.S. Chauhan
Published in Institute of Electrical and Electronics Engineers Inc.
2017
Abstract
In this paper, we presents the effect of higher back plane doping on analog figure of merit of fully depleted-silicon on insulator (FD-SOI) MOSFETs at RF frequencies. Procedure for DC and RF parameter extraction at RF frequencies has been discussed. Surface potential based Industry standard BSIM-IMG model for FD-SOI MOSFETs with enhanced gate parasitic network is used for validation of extracted DC and RF parameters such as gate resistance, gate parasitic capacitance, output conductance, transconductance. © 2016 IEEE.