In this paper, a novel transition from co-axial probe-to-substrate integrated waveguide (SIW) and from SIW-to-dielectric image line (DIL) is proposed in Ku-band (12-18 GHz). The proposed transition is designed on a single substrate and thus eliminates complex multi-layer fabrication process for implementation of dielectric image line two port network. The proposed design is simulated on Ansoft HFSS and exhibits wide bandwidth performance. For probe-to-SIW back-to-back transition, the relative bandwidth (-20dB) is 38.5% and for back-to-back transition from probe-to-SIW and from SIW-to-DIL, the relative bandwidth (-15dB) is 24.5%. The insertion loss is better than 3.2 dB throughout the operating bandwidth. Detailed studies on dimensions of the matching network is also discussed. The results are also verified by using CST Microwave Studio. © 2015 EurAAP.